Photosensitive Resin in Stereolithography Process
Stereolithgraphy nowadays is one of the most common rapid prototyping techniques. Photosensitive resins are main materials in the stereolithography process to obtain parts with specific shapes and applications. In this paper, the optimization of synthesis conditions for photosensitive resins had been studied. Photosensitive resins were characterized by the DSC, TGA, and FTIR. The results show that the sample had higher thermal stability properties, with the most pronounced improvements obtained for the reinforced epoxy acrylate specimens. The relation between post - cure shrinkage and the various process parameters used in the SL also have been investigated.
stereolithography (SL) photosensitive resins thermal stability
WANG Yong-zhen WANG Ai-ling XU Ring-she
College of Materials Science and Engineering, Taiyuan University of Technology, Taiyuan 030024, Chin Department of Mechanical Engineering, North University of China, Taiyuan 030051, China College of Materials Science and Engineering, Taiyuan University of Technology, Taiyuan 030024, Chin
国际会议
北京
英文
65-66
2006-08-03（万方平台首次上网日期，不代表论文的发表时间）