Study of the influence of the thickness of dielectric layer in a FED

摘要：

In our experiments a normal gate FED was fabricated by screen printing method, obtaining the spot size and brightness uniformity on the screen in the vacuum chamber. Then we measured the dielectric layers thickness. From the measurement results, the fluctuation of the dielectric layer is found. A simulation model is also constructed to analyze the sensitivity of the thickness of the dielectric layer on the brightness uniformity.

关键词： Dielectric layer Film uniformity Field emission display

作者: Xing Su Lifang Zhang Wei Lei Xiaobing Zhang

作者单位: Department of Electronic Engineering, Southeast University, Nanjing 210096, Peoples Republic of China

会议类型: 国际会议

会议名称: 19Th International Vacuum Nanoelectronics Conference & 50th International Field Emission Symposium(第19届真空微纳国际年会暨第50届场致发射国际会议)

会议地点: 桂林

会议语种:英文

页码: 451-452

在线出版日期: 2006-07-17（万方平台首次上网日期，不代表论文的发表时间）