单晶硅片制绒不均匀性对PECVD的影响

摘要：

The reflectivity reaches the lowest point at a right texturization time.Both large and small pyramid sizes lead to similar reflectivities.Nonuniform flow leads to nonuniform distribution of pyramid size.Wafer with SDR absorbs greater amount of additive than rough wafer.Enhancing the basicity of solution increases cleaning efficiency.The residue of additive on the textured wafer increases while applying SDR. A possible explanation could be that the wafer with arough surface reacts violently with KOH, releasing a large amount of H2, which hindering the absorption of additive to the wafer surface.

关键词： 硅太阳能电池 单晶硅片 制绒工艺 不均匀性

作者: 杜俊霖

作者单位: 中国科学院上海微系统与信息技术研究所

会议类型: 国内会议

会议名称: 2018 年第十四届中国太阳级硅及光伏发电研讨会

会议地点: 南昌

会议语种:中文

页码: 1-13

在线出版日期: 2018-11-01（万方平台首次上网日期，不代表论文的发表时间）