Transparent conductive Nb doped titanium oxide thin film deposited under low temperature by RF magnetron sputtering

摘要：

Outline Motivation Deposition method Purpose Results and discussion Properties of TiO2:Nb films under variation of deposition pressure Electrical Structural Chemical Passivation performance of i-a-Si:H films after TiO2:Nb deposition Summary

作者: Xuemei Cheng Kazuhiro Gotoh Hyunju Lee Noritaka Usami

作者单位: Graduate School of Engineering,Nagoya University Semiconductor Laboratory,Toyota Technological Institute

会议类型: 国内会议

会议名称: 2018 年第十四届中国太阳级硅及光伏发电研讨会

会议地点: 南昌

会议语种:英文

页码: 1-11

在线出版日期: 2018-11-01（万方平台首次上网日期，不代表论文的发表时间）