硅基GaN光电子及电力电子器件
There is a great potential in cost reduction for optoelectronics and power electronics by epitaxially integratingⅢ-Nitride semiconductors on large diameter silicon.This paper presents the R&D of GaN-on-Silicon for blue/UV LED,laser diode,and high electron mobility transistors(HEMTs).The epitaxial integration of GaN on silicon was hindered by two major technical challenges.The large lattice mismatch between GaN and Si(~17%)often causes a high density of dislocation defects,and the huge misfit in the coefficient of thermal expansion(~54%)results in crack network formation in the GaN epitaxial film.
硅基氮化镓 光电子器件 电力电子器件 产品开发
孙钱 刘建平 张立群 李德尧 张书明 杨辉
中科院/江苏省纳米器件重点实验室;中国科学院苏州纳米技术与纳米仿生研究所器件部;晶能光电有限公司 江苏省苏州工业园区若水路398号A630,215123 中科院/江苏省纳米器件重点实验室;中国科学院苏州纳米技术与纳米仿生研究所器件部
国内会议
苏州
中文
25-25
2015-10-30(万方平台首次上网日期,不代表论文的发表时间)