Development of The Next Generation Mono-crystalline Texture Agents

摘要：

Outline of Presentation 1,Texturing Mechanism Pyramid formation by ”micro mask theory”2,Features of the next generation texturing Low reflectance(＜10 ％at 600 nm) High productivity(Short time texturing 2 min～) Highly long run performance(Long life of texture agent) Low amount of waste water Low etching amount High tolerance to surface contamination(Applicable to various wafers)

作者: Seimei Akagi Yoshiteru Kamada Noboru Oyagi Toshinori Saida Yuzo Yamamoto

作者单位: SETTSU OIL MILL,INC. Japan Industrial Business Development

会议类型: 国内会议

会议名称: 第十二届中国太阳级硅及光伏发电研讨会

会议地点: 浙江嘉兴

会议语种:英文

页码: 1-25

在线出版日期: 2016-11-24（万方平台首次上网日期，不代表论文的发表时间）