超高頻均勻性高密度電漿源開發
(0) The plasma density reached 3.2×1015m-3,whilemaintaining electron temperature of aroundat a pressure of 120 Pa with a discharge gap of 10mm.The measured sheath potential was lower than the theoretical values, suggesting the existence of negative ions.To sum up,it is concluded that the developed VHF plasma source in this study provides a uniform. largearea and high density plasma That is suitable for the fabrication of high quality thin films.
电浆源 设备研发 频率特性
陳家富
逢甲大學 電子工程學系
国内会议
成都
中文
15-21
2016-10-22（万方平台首次上网日期，不代表论文的发表时间）