近年來台灣地區物理鍍膜技術與新穎薄膜材料的發展
The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to plasma based sputtering technology.The HiPIMS discharge is now an established ionized physical vaporde position technique, which is easily xalable and has been successfully introduced into various industrial applications-Recently, we fabricated the Zr-based, Ti-based and Fe-based thin filmmetallic glasses using magnetron sputtering technique and investigated the mechanical propenies enhancemem by different dapants and concentration control of by component-The test trials of TFMGs as the biomedical tools (surgical blade Vermatome and dental rotary instruments were successfully achieved and showed promising application potential.
薄膜材料 物理镀膜 显微结构 机械性质
李志偉
明志科技大學材料工程系
国内会议
成都
中文
30-35
2016-10-22（万方平台首次上网日期，不代表论文的发表时间）