Photoresist-induced Large-Area Growth and Precisely Positioning of Organic Microwire Arrays for Device Applications
We have reported an evaporation-induced self-assembly technique that can enable the growth, alignment, and periodic patterning of organic 1D single-crystal nanowires (NWs)/micro-wires (MWs)at solid/liquid or liquid/liquid interface.However, most of the resulting single-crystals have limited growth length;moreover, their alignment density and precise positioningare difficult to accurately control, which is crucial for practical device applications.Recently, we developed an improved method of using photoresist as template for large-area growth of ultra-long organic micro/nanowire arrayswith controlled alignment density and position.The position and alignment density of micro/nanowires can be precisely controlled by the location and periodicity of photoresist, which can be readily tuned by photolithography.The MW arrays could span over the whole substrate with extremely high uniformity and reproducibility.High-performance photodetectors based on the organic MW arrays were constructed,verifying the great potential of the strategy for future high-performance, integrated organic crystal device applications.
Wei Deng Xiujuan Zhang
Functional Nano & Soft Materials LaboratorySoochow University199 Ren-Ai Road, Suzhou Industrial ParkSuzhou, Jiangsu 215123, P.R.China
国内会议
国家自然科学基金委员会“可控自组装体系及其功能化”重大研究计划年度会议暨研讨会
厦门
英文
150-150
2015-02-05（万方平台首次上网日期，不代表论文的发表时间）