7YSZ coating prepared by PS-PVD based on heterogeneous nucleation
A Plasma spray-physical vapor deposition (PS-PVD) as a novel coating process based on low pressure plasma spray (LPPS) has been significantly used, where deposition takes place not only from liquid splats but also from nano-sized clusters and from the vapor phase in contrast to conventional technologies.As a consequence, thin, dense and porous ceramic coating for special application needs can be deposited through PS-PVD due to its high power, very low pressure, etc.This offers new opportunities to obtain different advanced microstructures and thus to meet the growing requirements in modern functional coatings.To better exploit the potential of such a gas phase deposition from PS-PVD, the deposition mechanisms and their dependency on process conditions must be understood detailedly.Therefore, coating experiments were performed at variant process conditions.Based on the observed phenomenon, a deposition mechanism of heterogeneous nucleation is presented.
PS-PVD Disposition Mechanism
X.F.Zhang K.S.Zhou M.Liu C.G.Deng C.M.Deng J.Mao Z.Q.Deng
National Engineering Laboratory for Modem Materials Surface Engineering Technology & The Key Lab of Guangdong for Modem Surface Engineering Technology,Guangdong Institute of New Materials,Guangzhou 510650,China
国内会议
长沙
英文
141-146
2016-11-11（万方平台首次上网日期，不代表论文的发表时间）