Facile Preparation of Rutile TiO2NanorodArrays in a Low HCL Concentration Vapor Environment by AVO Process and Characterizations
In this study,oriented rutile TiO2nanorod arrays (NRAs) were directly grown on the titanium (Ti) thin films deposited on the Si substrate in a low concentration of hydrochloric acid aqueous solution vapor environment called acid vapor oxidation (AVO) process which is a facile and environmentally friendly hydrothermal route without using any catalysts,seeds or templates.The growth of the TiO2 NRAs can be controlled by adjusting the key experimental parameters,such as growth time and low HCL concentration and so on.The effects of the key experimental parameters on their morphologies and crystal structures were explored in detail by X-ray diffraction,scanning electron microscopy,transmission electron microscopy and selected area electron diffraction.The results indicate that the growth time and the low HCL concentration have influence on tailoring the crystal structures,like density,diameter and crystallinity of the TiO2 NRAs.Therutile TiO2 NRAs weresingle crystalline and grown along the ”1 0 1” direction.The rutile TiO2 NRAsprepared in a low HCL concentration vapor environment by AVO process could be widely used in kinds of applications,especially gas sensors which will be explored further in the follow work.
TiO2nanorods Acid vapor oxidation Growth time Low HCL concentration
Hairong WANG Qiao SUN Guishan WU Yuqing YAO Yixue LI
State Key Laboratory for Manufacturing Systems Engineering Mechanical Engineering School,Xi”an Jiaotong University Xi”an,Shaanxi,China,710049
国内会议
西安
英文
1-8
2016-09-01（万方平台首次上网日期，不代表论文的发表时间）