Characterization of Inorganic Thin Films and Nanostructures by ToF-SIMS

摘要：

When ToF-SIMS was introduced in the early 80”s ”1,2”,it was considered to bethe ideal instrument for the analysis of the uppermost monolayer of a solid.Due to thepulsed operation of the primary ion beam with a very low duty cycle of 10-3to 10-5,the sample consumption was extremely low while at the same time high transmissionand parallel mass detection enabled an optimum sensitivity.

作者: Ewald Niehuis

作者单位: ION-TOF GmbH,Mendelstrasse 15,48149Muenster,Germany

会议类型: 国内会议

会议名称: 第五届中国二次离子质谱学会议

会议地点: 北京

会议语种:英文

页码: 7-8

在线出版日期: 2014-10-18（万方平台首次上网日期，不代表论文的发表时间）