The Microstructure, Texture and Sputtering Properties of Molybdenum Targets Fabricated by Different Metallurgical Processes
This study prepared Mo sputtering targets with different microstructures and textures through using several metallurgical processes.The effects of microstructure and texture on the sputtering properties of Mo target were investigated.The experimental results showed that a fully dense,fine-grained and randomly orientated Mo target exhibiting the highest deposition rate was obtained by hot isostatic pressing process.However,the electrical resistivity of the deposited Mo films was high due to the high oxygen content in the Mo target.Mo only reached 97％ density by hydrogen sintering.The density could reach 100％ through the further rolling process,but the deposition rate obviously decreased after the plastic working.Although annealing treatment after rolling could change the microstructure from deformed to recrystallized and thus improve the deposition rate,the value was still lower than that of the sintering.This is possibly attributed to the texture transformation from random to intensely (100) orientated.
molybdenum sputtering target microstructure deposition rate
Hung-Shang Huang Huan-Chien Tung Chun-Hao Chiu In-Ting Hong
New Materials Research & Development Department,China Steel Corporation,Kaohsiung 81233,Taiwan,Republic of China
国内会议
厦门
英文
1-6
2013-11-01（万方平台首次上网日期，不代表论文的发表时间）