Investigation of the maskless lithography technique for the rapid and cost-effective prototyping of microfluidic devices in laboratories
This paper describes maskless lithography as a rapid and cost-effective technique forfabricating high-quality microfluidic devices in laboratories.The detailed effects of exposureparameters on microstructure features are explored.A quantitative analysis of these effectsprovides insights into the device design and the selection of optimum processing parameters.To overcome the limitation of small exposure area,subregion stitching and sequentialexposure are adopted for fabricating larger patterns.Seamless stitching between adjacentexposure subregions is achieved by optimizing the grayscale values of the stitchingside/corner.These data are also valuable for exploring grayscale and multi-step lithography.Various hydrodynamic microdevices are then fabricated and characterized to validate theoptimized parameters.
Nan Xiang Hong Yi Ke Chen Shanfang Wang Zhonghua Ni
School of Mechanical Engineering,Southeast University,Nanjing 211189,People’s Republic of China;Jiangsu Key Laboratory for Design and Manufacture of Micro-Nano Biomedical Instruments,Nanjing 211189,People’s Republic of China
国内会议
杭州
英文
52-62
2014-10-01（万方平台首次上网日期，不代表论文的发表时间）