Automatic Laser Interference Lithography System for Nanofabrication

摘要：

　　Laser interference lithography is a promising nanofabrication technique with high efficiency andlow cost properties.In this paper,the principle of multi laser beams interference has been described andfour-beam interference patterns have been presented.In order to acquire diverse periodic interference patternseasily,a prototype of automatic multi-beam LIL system,which consisted of beam split module,interferencecontrol module,beam shaping module and sample positioning module has been proposed.

关键词： Laser interference lithography Nanofabrication Period structures

作者: Wei Zhang Xiaoyong Gu Weiping Liu Lei Yuan Feng Zhang Yanyan Wang Changsi Peng

作者单位: Institute of Information Optical Engineering,Soochow University,Suzhou 215006,China Institute of Information Optical Engineering,Soochow University,Suzhou 215006,China;Optoelestronics

会议类型: 国内会议

会议名称: 2012年全国光学工程博士生论坛

会议地点: 南京

会议语种:英文

页码: 181-186

在线出版日期: 2012-06-08（万方平台首次上网日期，不代表论文的发表时间）