Fabrication and application of Si-doped diamond welding dies
Si-doped diamond films are deposited on cobalt cemented tungsten carbide (WC-Co) welding dies using hotfilament chemical vapor deposition (HFCVD) method, where tetraethoxysilane (C8H20O4Si) is introduced in the reactivechamber as silicon source by bubbling method. Filed emission scanning electron microscope (FESEM) and Ramanspectroscopy are used to characterize the as-deposited diamond films. The results show that silicon doping can reduce thediamond crystal size and residual stress of diamond films, and also increase the FWHM of first order diamond Raman line.The polishing time of diamond coated welding dies also can be shortened by silicon doping. Although the Si-doped diamondfilms have lower hardness, Si-doped diamond coated welding dies possesses comparable practical application performancewith conventional diamond coated welding dies. Compared with the nylon and WC-Co welding dies, the working lifetime ofdiamond coated welding dies increases 200 and 10 times, respectively.
HFCVD diamond silicon doping welding dies WC-Co
Liang Wang BinShen Fanghong Sun Zhiming Zhang
School of Mechanical Engineering, Shanghai Jiao Tong University,Shanghai, 200240, China
国内会议
无锡
英文
61-66
2012-10-19（万方平台首次上网日期，不代表论文的发表时间）