Spray coating and large gap exposure technology -One of the key processes in the MEMS fabrication

摘要：

　　MEMS devices require high topographic structures. Many of them cause problems for resist process withspin coating technique. Another problem is the high distance for exposure tool which reduce the resolution dramatically.In order to solve these problems, Suss developed spray coating technology and large gap exposureoptics. New development of so called MO (Microlens Optics) exposure Optics makes high resolution insubmicron area with large proximity distance possible.

关键词： 微机电系统器件 喷涂技术 透镜光学

作者: L. Gong

作者单位: China SUSS Micro Tec (Shanghai) Co., Ltd.

会议类型: 国内会议

会议名称: 2011传感器与MEMS技术产业化国际研讨会

会议地点: 苏州

会议语种:英文

页码: 1-20

在线出版日期: 2011-10-27（万方平台首次上网日期，不代表论文的发表时间）