Projection Aligner for MEMS Production

摘要：

　　USHIO is introducing the mass production system with large area projection elposure (8 inch one shot)and the high precision technology.As everybody knows, MEMS devices requires high alignment accuracy as well as the high precision patterning on high scallop area at photo lithography process. Especially, for the warped wafer, which canbe seen in the actuator mass production of various sensor devices, it is difficult to keep high alignment accuracy. Also, the market is still looking for a tool which achieves both high throughput of conventional contact elposure tool and high yield of reduction projection stepper.

关键词： 微机电系统设备 USHIO技术 曝光系统 对准精度

作者: Masayuki Itaba

作者单位: Technology & engineering General Manager Ushio Inc. Exposure Business unit

会议类型: 国内会议

会议名称: 2011传感器与MEMS技术产业化国际研讨会

会议地点: 苏州

会议语种:英文

页码: 1-20

在线出版日期: 2011-10-27（万方平台首次上网日期，不代表论文的发表时间）