Microwave Plasma Sources-Applications in Industry
Plasma, eYCited with microwave energy, has Very interesting properties which are in direct correlation with the eYCitation frequency. This is due to the reachable high electron density, which itself has an influence on the density of further generated particles like ions, radicals, excited atoms and molecules or UV light. Altogether they are responsible for the high chemical reactivity of microwave plasmas attaining their maximum in the pressure regime between 1 and a few hundred Pa. Therefore, comparatively low end pumping systems can be used to achieve good results in etching, activation and deposition processes. Together with the availability of microwave power, grown with the market of microwave heating technology, microwave plasma is an interesting tool for industrial applications. Scalability of power up to 100 kW per single magnetron tube and lateral dimensions of a few square meters per single plasma source have opened the field to industrial thin film technology for typical large area applications as solar or other flat panel industries.
等离子体 工业应用 薄膜技术
Oliver Eckstein
Asia Pacific ROTH & RAU MUEGGE GmbH
国内会议
苏州
英文
1-25
2011-10-27（万方平台首次上网日期，不代表论文的发表时间）