Fabrication and measurement of high-g MEMS accelerometer
A high-g beam-mass structure accelerometer was designed.In this structure, by means of KOH hack etching on the mass, V-groove structure was fabricated on the backside of the mass, so the weight of the mass and al-so the relative distance between the mass center and the neutral plane were all decreased.With the thin mass struc-tore, we can take advantage of both beam-mass structure and flat film structure; the fabrication process is also sim-ple.By means of Hopkinson shock test system, we did the accelerometer calibration.According to the test result,the sensitivity of the MEMS accelerometer is 0.71 μV/g, which keeps in accordance with the theoretical calculation.After a 200 000 g shocking test, the micro structure worked as usual, so this design can satisfy the requirements ofhigh shock, seriously vibration test environment.
MEMS 加速度计 Fabrication measurement 高斯光束 V形槽结构 振动测试
Shi Yunbo Liu Jun Qi Xiaojin Meng Meiyu
国内会议
北京
英文
1345-1349
2008-07-22（万方平台首次上网日期，不代表论文的发表时间）