In situ TEM-Tandem/Implanter Interface Facility in Wuhan University for Investigation of Radiation Effects
A Hitachi H800 transmission electron microscope (TEM) was linked to a 200kV ion implanter and a 2×1.7MV tandem accelerator through the interface system designed on the basis of ion beam transportation calculations. The facility provides combined or separated use of the implanter, the accelerator and the microscope. 400 to 3400kV ions (except noble gas ions) implantation and 15 to 200kV gas ions implantion are available. With this facility, evolution of microstructures during ion irradiation for the evaluation of irradiation-resistance performance of nuclear materials can be observed. In the test experiments, ion beams of N<+>, He <+>, Ar<+>, and H<+> were successfully transported from the implanter into the TEM chamber through the interface system, and the ion currents measured at the entrance of the TEM column were between 20~80nA. The amorphisation process of Si crystal irradiated by N<+> ion beams was successfully observed in the preliminary experiments, demonstrating that this interface facility is capable of in situ study of ion irradiated samples.
Liping GUO Ming LI Chuansheng LIU Zheng YANG Bo SONG Mingsheng YE Xiangjun FAN Dejun FU
Accelerator Laboratory, School of Physics, Wuhan University, Wuhan 430072, China
国际会议
桂林
英文
89-91
2007-10-23（万方平台首次上网日期，不代表论文的发表时间）