Effect of gas pressure on the mechanical properties of sputtered TaN films
Tantalum nitride as a promising material for applications has attracted considerable interest due to such promising properties as superhardness and high temperature stability. In this paper, the TaN films were deposited on the single crystal superalloy by radio frequency (RF) reactive magnetron sputtering in an argon-nitrogen atmosphere. The effect of gas pressure on the mechanical property, morphology, phase structure, residual stress, tribological property of the films is investigated by scanning electron microscopy (SEM). X-ray diffraction (XRD), X-ray stress measurement and SRV friction and wear test, respectively. The results show that the partial pressure of N2 has a great influence on the phase structure, residual stress and nano-hardness.
TaN film mechanical property residual stress morphology
Erbao Liu Guo Jin Xiufang Cui Jinggao Zhong Tianmin Shao
School of Materials Science and Chemical Engineering, Harbin Engineering University, Harbin 150001, State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, China
国际会议
北京
英文
781-783
2012-10-23（万方平台首次上网日期，不代表论文的发表时间）