A Si3N4 TUBE FORMED USING TMAH ETCHING
In this paper, micro-tube fabricated from SiO2/Si3N4 strained composite structures using a self-scrolling procedure is presented. This fabrication is a self-organization process using stress of bifilm. This technique is based on self-rolling of a thin highly strained SiO2/ Si3N4 bifilm detached from the substrate by TMAH selective etching. The material of bifilm and the solution for anisotropic etching are in common use, so this method can be widely used in the future.
Micro-tube TMAH Si3N4 Anisotropic etching
Huijun Chen Dacheng Zhang
Institute of Microelectronics ,Peking University , Beijing, China P.R. 100086
国际会议
海南三亚
英文
2007-01-10(万方平台首次上网日期,不代表论文的发表时间)