FABRICATION OF TWO-DIMENSIONAL PHOTONIC CRYSTALS ON N-TYPE SILICON SUBSTRATE USING HOLOGRAPHIC AND WET ETCHING TECHNIQUES

摘要：

Technique of fabricating two-dimensional (2D) photonic crystals (PCs) in silicon wafers using the combination of holographic lithography and wet etching is described in the paper. The fabricated silicon material is suitable to be used as porous silicon for Ge/Si quantum dots growth or other applications. Single exposure holographic method was adopted to fabricate the photoresist mask with the pattern of 2D hexagonal lattice structure. HF:HNO3:CH3COOH = 4:4:3 solution was used to etch circular pores with bowl-shaped bottom into silicon substrate at room temperature with 30 s etching time. Periodic structure in silicon with 1 μ m lattice constant and 200 nm pore depth was obtained in the experiment. The fabrication process is fast and cost-effective thus having the potential for industrial mass production of porous silicon.

作者: Han Lin Shou Liu Xiangsu Zhang

作者单位: Department of Physics, Xiamen University, Xiamen 361005, China

会议类型: 国际会议

会议名称: 2007年微纳系统集成及其商业化应用国际学术会议(2007 International Conference & Exhibition on Integration and Commercialization of Micro and Nano-Systems)

会议地点: 海南三亚

会议语种:英文

在线出版日期: 2007-01-10（万方平台首次上网日期，不代表论文的发表时间）